February 19, 2025
2025 John Fenn Sr. Endowed Scholarship goes to Hamza Ansar, University of Colorado – Boulder
Congratulations to Hamza Ansar, recipient of the 2025 John Fenn, Sr. Endowed Scholarship. Hamza received his MS at the University of Illinois at Urbana Champaign before coming to the University of Colorado – Boulder to work on his PhD in Chemistry. Hamza says, “I moved to Boulder and joined the George Lab. Dr Steve George is an expert in atomic layer deposition (ALD) and etching (ALE). I learned to design and build vacuum systems for ALD and ALE in his lab. In addition, I had the opportunity to use characterization techniques like spectroscopic ellipsometry, GIXRD, AFM, and XPS. These techniques characterize thickness, roughness, phases, composition, and other thin film features. I am currently working on thermal etching of indium gallium oxide (IGO) by employing thermal ALE to produce ultrathin and smooth films for the next generation microelectronic devices. Indium gallium oxide (IGO) is a transparent conductive oxide material being researched as a channel material in oxide semiconductor-based thin-film transistors (TFTs). These TFTs have high carrier mobility, low leakage current, and wider bandgap compared to amorphous and polycrystalline silicon, making them highly desirable for applications in the display industry.”
Hamza writes, “Being awarded this esteemed scholarship has renewed my motivation to work to achieve my goals. I am overjoyed to receive a scholarship established by a Nobel laureate and an esteemed member of the scientific community. I feel truly honored, and I aspire to follow in footsteps of Dr John Fenn, Sr.”
