February 19, 2025
2025 Helen & Rolf Illsley Scholarship awarded to Dongjae Shin, University of Michigan
Congratulations to Dongjae Shin, recipient of the 2025 Helen & Rolf Illsley Scholarship. Dongjae has a BS from Konkuk University, an MS from KAIST, and is now studying for his PhD in Materials Science and Engineering at the University of Michigan. Dongjae’s experience with vacuum coating technology started at the University of Michigan, where he used reactive sputtering and atomic layer deposition.
For his research into ionic conduction, he chose to study hafnium oxide thin films. He says, “HfO2 is widely used for gate dielectrics, resistive memory, and ferroelectrics. The ionic conduction properties of amorphous HfO2 films differ significantly from those of crystalline materials. My research aims to understand the design rules that govern ionic conduction in metal oxides, especially in thin films that are widely used for microelectronic applications.”
To the fund donors, Dongjae writes, “I am writing to express my deepest gratitude for awarding me the Helen & Rolf Illsley Scholarship. Being recognized by such a prestigious and generous foundation is truly an honor. Your support means more to me than words can adequately express. It is not just financial aid but a vote of confidence in my potential and capabilities. With your help, I am one step closer to achieving my dreams and making a positive impact in my chosen field.”
